著作一覧（邑瀬邦明）

原著論文（*印：邑瀬が執筆したもの）

※ 2013年以降のデータは研究室の「研究業績」を参照ください

- 2012年

• 品川 勉, 千金正也, 邑瀬邦明, 伊崎昌伸
  外部電源を使用しない酸化亜鉛の電解析出
  科学と工業, 86(12), 427-431 (2012).
• M. U. Herrera, T. Ichii, K. Murase, and H. Sugimura
  Vinylferrocene Photochemical Preparation on Si(111) Surface in Different Grafting Media
  Chem. Lett., 41(10), 1188-1190 (2012).
• Om P. Khatri, T. Ichii, K. Murase, and H. Sugimura
  UV Induced Covalent Assembly of Gold Nanoparticles in Linear Patterns on Oxide Free Silicon Surface
  J. Mater. Chem., 22(32), 16546-16551 (2012).
• M. U. Herrera, T. Ichii, K. Murase, and H. Sugimura
  Photochemical Preparation of Methyl-terminated Si(111) Surface Using a Grignard Reagent
  Chem. Lett., 41(9), 902-904 (2012).
• T. Ichii, M. Fujimura, M. Negami, K. Murase, and H. Sugimura
  Frequency Modulation Atomic Force Microscopy in Ionic Liquid Using Quartz Tuning Fork Sensors
  Jpn. J. Appl. Phys., 51(8), 08KB08 [5 pages] (2012).
• T. Shinagawa, M. Chigane, K. Murase, and M. Izaki
  Drastic Change in Electrical Properties of Electrodeposited ZnO: Systematic Study by Hall Effect Measurements
  J. Phys. Chem. C, 116, 15925-15931 (2012).
• Om P. Khatri, T. Ichii, K. Murase, M. Kanehara, T. Teranishi, and H. Sugimura
  Covalent Assembly of Silver Nanoparticles on Hydrogen-terminated Silicon Surface
  J. Colloid Interf. Sci., 382(1), 22-27 (2012).
• J.-H. Yang, T. Ichii, K. Murase, and H. Sugimura
  Site-Selective Assembly and Reorganization of Gold Nanoparticles along Aminosilane-Covered Nano lines Prepared on Indium-Tin Oxide
  Langmuir, 28(20), 7579-7584 (2012).
  
• J.-H. Yang, T. Ichii, K. Murase, H. Sugimura, T. Kondo, and H. Masuda
  Nanotemplate Prepared by Means of Vacuum Ultraviolet Patterning of Alkylsilane Self-assembled Monolayer on ITO Using a Porous Alumina Mask: Application to the Fabrication of Gold Nanoparticle Arrays
  Chem. Lett., 41(4), 392-393 (2012).
  
• 下川公博, 川口賢一, 西田幸司, 邑瀬邦明, 杉村博之, 粟倉泰弘
  玉野製錬所ニカワ連続溶解設備導入によるニカワ・電力原単位削減
  Journal of MMIJ（資源と素材）, 128(3), 155-159 (2012).
• J.-H. Yang, T. Ichii, K. Murase, and H. Sugimura
  Circular Arrays of Gold Nanoparticles of a Single Particle Line Thickness Formed on Indium Tin Oxide
  Appl. Phys. Exp., 5(2), 025202 [3 pages] (2012).
  

- 2011年

• T. Uda, K. Tsuchimoto, H. Nakagawa, K. Murase, Y. Nose, and Y. Awakura
  Electrochemical Polishing of Metallic Titanium in Ionic Liquid
  Mater. Trans., 52(11), 2061-2066 (2011). (一社)資源・素材学会第38回論文賞
• *K. Murase, T. Suzuki, Y. Umenaka, T. Hirato, and Y. Awakura
  Thermodynamics of Cathodic ZnTe Electrodeposition Using Basic Ammoniacal Electrolytes: Why CdTe Can Deposit While ZnTe Cannot
  High Temp. Mater. Process., 30(4-5) 451-458 (2011).
• H. Sugimura, T. Moriguchi, M. Kanda, Y. Sonobayashi, H. M. Nishimura, T. Ichii, K. Murase
  Molecular Packing Density of a Self-assembled Monolayer Formed from N-(2-aminoethyl)-3-aminopropyltriethoxysilane by a Vapor Phase Process
  Chem. Commun., 47(31), 8841-43 (2011).
• H. Sugimura, M. Kanda, T. Ichii, and K. Murase
  Self-aligned Nucleation of Gold onto Templates with a Nano-scale Precision Fabricated by Scanning Probe Lithography
  J. Photochem. Photobiol. A: Chemistry, 221(2-3), 209-213 (2011).
• H. Sano, M. Zhao, D. Kasahara, K. Murase, T. Ichii, H. Sugimura
  Formation of Uniform Ferrocenyl-terminated Monolayer Covalently Bonded to Si Using Reaction of Hydrogen-Terminated Si (111) Surface with Vinylferrocene/n-Decane Solution by Visible-Light Excitation
  J. Colloid Interface Sci., 361(1), 259-269 (2011).
• *K. Murase, A. Ito, T. Ichii, and H. Sugimura
  Preparation of Cu-Sn Layers on Polymer Substrate by Reduction-Diffusion Method Using Ionic Liquid Baths
  J. Electrochem. Soc., 158(6), D335-D341 (2011).

- 2010年

• 下川公博, 成田 誠, 隅田育伸, 邑瀬邦明, 杉村博之, 粟倉泰弘
  銅電解精製におけるワックスレスパーマネントカソードプロセスのラミネーション界面
  Journal of MMIJ（資源と素材）, 126(12), 697-700 (2010).
• H. Sano, K. Ohno, T. Ichii, K. Murase, and H. Sugimura
  Alkanethiol Self-Assembled Monolayers Formed on Silicon Substrates
  Jpn. J. Appl. Phys., 49(1) (Special Issue: Molecular Electronics and Bioelectronics), 01AE09 [5 pages] (2010).
• *Q.-W. Sun, K. Murase, T. Ichii, H. Sugimura
  Anionic Effect of Ionic Liquids Electrolyte on Electrochemical Behavior of Ferrocenylthiol/alkanethiol Binary SAMs
  J. Electroanal. Chem., 643(1-2), 58-66 (2010).

- 2009年

• Y.-J. Kim, J. Han, H. Sano, K.-H. Lee, K. Noda, T. Ichii, K. Murase, K. Matsushige, and H. Sugimura
  Organosilane Self-assembled Multilayer Formation Based on Activation of Methyl-Terminated Surface with Reactive Oxygen Species Generated by Vacuum Ultra-violet Excitation of Atmospheric Oxygen Molecules
  Appl. Surf. Sci., 256(5), 1507-1513 (2009).
• T. Ichii, S. Nanjo, K. Murase, and H. Sugimura
  Reversible Potential Change of Ferrocenylthiol Monolayers Induced by Atomic Force Microscopy
  Jpn. J. Appl. Phys., 48(8) (Special Issue: Scanning Probe Microscopy), 08JB15 [4 pages] (2009).
• T. Shinagawa, K. Murase, and M. Izaki
  Sustainable Electrodeposition of ZnO by a Galvanic Contact Method
  Electrochem. Solid-State Lett., 12(9), D72-D75 (2009).
• *A. Ito, K. Murase, T. Ichii, and H. Sugimura
  Cu-Sn Alloy Metallization of Polymer Substrate through Reduction-Diffusion Method Using Ionic Liquid Bath at Medium-Low Temperatures
  Electrochemistry 電気化学および工業物理化学, 77(8), 677-679 (2009).
• H. Sugimura, S. Nanjo, H. Sano, and K. Murase
  Gold Nanoparticle Arrays Fabricated on a Silicon Substrate Covered with a Covalently Bonded Alkyl Monolayer by Electroless Plating Combined with Scanning Probe Anodization Lithography
  J. Phys. Chem. C, 113(27), 11643-11646 (2009).
• H. Sano, H. Maeda, T. Ichii, K. Murase, K. Noda, K. Matsushige, and H. Sugimura
  Alkyl and Alkoxyl Monolayers Directly Attached to Silicon: Chemical Durability in Aqueous Solutions
  Langmuir, 25(10), 5516-5525 (2009).
• T. Shinagawa, K. Murase, S. Otomo, J. Katayama, and M. Izaki
  Effects of Counteranions and Dissolved Oxygen on Chemical ZnO Deposition from Aqueous Solutions Contaioning Dimethylamineborane
  J. Electrochem. Soc., 156(5), H320-H326 (2009).
• Om P. Khatri, T. Hatanaka, K. Murase, and H. Sugimura
  Probing the Diffusion of Vacuum Ultraviolet (λ = 172 nm) Induced Oxidants by Nanoparticles Immobilization
  Appl. Surf. Sci., 255(24), 9817-9821 (2009).
• H. Sano, T. Yaku, T. Ichii, K. Murase, and H. Sugimura
  Soft Processing for Formation of SAM on Hydrogen-Terminated Silicon Surface Based on Visible-Light Excitation
  J. Vac. Sci. Technol. B, 27(2), 858-862 (2009).
• J. Han, D. Kasahara, T. Ichii, K. Murase, and H. Sugimura
  Scanning Probe Anodization Patterning of Si Substrates Covered with a Self-Assembled Monolayer Dependent on Hydrophilicity
  J. Vac. Sci. Technol. B, 27(2), 928-933 (2009).
• Y.-J. Kim, Y. Taniguchi, K. Murase, Y. Taguchi, and H. Sugimura
  Vacuum Ultraviolet-Induced Surface Modification of Cyclo-Olefin Polymer Substrates for Photochemical Activation Bonding
  Appl. Surf. Sci., 255(6), 3648-3654 (2009).

- 2008年

• Om P. Khatri, J. Han, T. Ichii, K. Murase, and H. Sugimura
  Self-Assembly Guided One-Dimensional Arrangement of Gold Nanoparticles: A Facile Approach
  J. Phys. Chem. C, 112(42), 16182-16185 (2008).
• Om P. Khatri, H. Sano, K. Murase, and H. Sugimura
  Regulation of Pattern Dimension as a Function of Vacuum Pressure: Alkyl Monolayer Lithography
  Langmuir, 24(20), 12077-12085 (2008).
• H. Sano, H. Maeda, S. Matsuoka, K.-H. Lee, K. Murase, and H. Sugimura
  Self-Assembled Monolayers Directly Attached to Silicon Substrates Formed from 1-Hexadecene by Thermal, Ultraviolet, and Visible Light Activation Methods
  Jpn. J. Appl. Phys., 47(7), 5659-5664 (2008).
• S. Yagi, H. Oshima, K. Murase, E. Matsubara, and Y. Awakura
  Electrochemical Iron-Chromium Alloying of Carbon Steel Surface Using Alternating Pulsed Electrolysis
  Mater. Trans., 49(6), 1346-1354 (2008).
• Om P. Khatri, K. Adachi, K. Murase, K. Okazaki, T. Torimoto, N. Tanaka, S. Kuwabata, and H. Sugimura
  Self-Assembly of Ionic Liquid (BMI-PF₆)-Stabilized Gold Nanoparticles on a Silicon Surface: Chemical and Structural Aspects
  Langmuir, 24(15), 7785-7792 (2008).
• Om P. Khatri, K. Murase, and H. Sugimura
  Spatially Controlled Functionalization and Chemical Manipulation to Fabricate Two-Dimensional Arrays of Gold Nanoparticles onto Indium Tin Oxide
  Jpn. J. Appl. Phys., 47(6), 5048-5052 (2008).
• T. Moriguchi, K. Murase, and H. Sugimura
  Ruthenium-Amine Complexation for Constructing Self-Assembled Molecular Films
  Colloids and Surfaces A: Physicochem. Eng. Aspects, 321(1-3), 94-98 (2008).
• H. Sugimura, H. Yonezawa, S. Asai, Q.-W. Sun, T. Ichii, K.-H. Lee, K. Murase, K. Noda, and K. Matsushige
  Alternate Stacking of Transition Metal Ions and Terephthalic Acid Molecules for the Fabrication of Self-Assembled Multilayers
  Colloids and Surfaces A: Physicochem. Eng. Aspects, 321(1-3), 249-253 (2008).
• Y.-J. Kim, K.-H. Lee, H. Sano, J. Han, T. Ichii, K. Murase, and H. Sugimura
  Surface Chemical Conversion of Organosilane Self-Assembled Monolayers with Active Oxygen Species Generated by Vacuum Ultraviolet Irradiation of Atmospheric Oxygen Molecules
  Jpn. J. Appl. Phys., 47(1), 307-312 (2008).
• Om P. Khatri, K. Murase, and H. Sugimura
  Structural Organization of Gold Nanoparticles onto the ITO Surface and its Optical Properties as a Function of Ensemble Size
  Langmuir, 24(8), 3787-3793 (2008).

- 2007年

• *K. Murase, R. Kurosaki, T. Katase, H. Sugimura, T. Hirato, and Y. Awakura
  Electrochemical Alloying of Copper Substrate with Tin Using Ionic Liquid as an Electrolyte at Medium-Low Temperatures
  J. Electrochem. Soc., 154(11), D612-D616 (2007).
• 山末英嗣, 延原功一, 邑瀬邦明, 石原慶一
  メカニカルミリングにより結晶構造変化した酸化チタンを用いたNO分解
  粉体および粉末冶金, 54(10), 686-693 (2007).
• J. Han, K.-H. Lee , S. Fujii, H. Sano, Y.-J. Kim, K. Murase, T. Ichii, and H. Sugimura
  Scanning Capacitance Microscopy for Alkylsilane-Monolayer-Covered Si Substrate Patterned by Scanning Probe Lithography
  Jpn. J. Appl. Phys., 46(8B), 5621-5625 (2007).
• S. Fujii, K. Murase, and H. Sugimura
  Multicycle Desorption-Adsorption Voltammetry for Self-Assembled Mixed Monolayer Containing Ferrocenylthiol Molecules: A Discussion on Molecular Interaction in the Mixed Layer
  Electrochemistry 電気化学および工業物理化学, 75, 523-527 (2007).
• S. Yagi, A. Kawakami, K. Murase, and Y. Awakura
  Ni-Mo Alloying of Nickel Surface by Alternating Pulsed Electrolysis Using Molybdenum(VI) Baths
  Electrochem. Acta, 52(19) 6041-6051 (2007).
• S. Yagi, K. Murase, T. Hirato, and Y. Awakura
  Alternating Pulsed Electrolysis for Iron-Chromium Alloy Coatings with Continuous Composition Gradient
  J. Electrochem. Soc., 154(6), D304-D309 (2007).
• *N. Tajimi, H. Sano, K. Murase, K.-H. Lee, and H. Sugimura
  Thermal Immobilization of Ferrocene Derivatives on (111) Surface of n-Type Silicon: Parallel between Vinylferrocene and Ferrocenecarboxaldehyde
  Langmuir, 23(6) 3193-3198 (2007).
• S. Fujii, S. Kurokawa, K. Murase, K.-H. Lee, A. Sakai, and H. Sugimura
  Self-assembled Mixed Monolayer Containing Ferrocenylthiol Molecules: STM Observations and Electrochemical Investigations
  Electrochem. Acta, 52(13), 4436-4442 (2007).
• T. Katase, K. Murase, T. Hirato, and Y. Awakura
  Redox and Transport Behaviors of Cu(I) Ions in TMHA-Tf₂N Ionic Liquid Solution
  J. Appl. Electrochem., 37(3), 339-344 (2007).

- 2006年

• N. V. Krstajic, L. M. Vracar, S. G. Neophytides, J. M. Jaksic, K. Murase, R. Tunold, and M. M. Jaksic
  Supported Interactive Electrocatalysis for Hydrogen and Oxygen Electrode Reactions
  J. New Mater. Electrochem. Sys., 9(2), 83-97 (2006).
• H. Yonezawa, K.-H. Lee, K. Murase, and H. Sugimura
  Self-assembled Multilayer Formed by Alternate Stacking of Zirconium and Terephthalic Acid Layers
  Chem. Lett., 35(12), 1392-1393 (2006).［速報論文］
• *K. Murase, H. Tada, T. Shinagawa, M. Izaki, and Y. Awakura
  QCM Studies of Chemical Solution Deposition of ZnO in Aqueous Media Containing Zinc Nitrate and Dimethylamineborane
  J. Electrochem. Soc., 153(11), C735-C740 (2006).
• T. Shinagawa, M. Izaki, H. Inui, K. Murase, and Y. Awakura
  Microstructures and MR Effects of Transparent Ferromagnetic Chemically Prepared Fe−Zn−O Films
  Physica Status Solidi (a), 203(11), 2760-2764 (2006).
• H. Sugimura, H. Sano, K.-H. Lee, K. Murase
  Organic Monolayers Covalently Bonded to Si as Ultra Thin Photoresist Films in Vacuum UV Lithography
  Jpn. J. Appl. Phys., 45(6B), 5456-5460 (2006).
• T. Katase, S. Imashuku, K. Murase, T. Hirato, and Y. Awakura
  Water Content and Related Physical Properties of Aliphatic Quaternary Ammonium Imide-Type Ionic Liquid containing Metal Ions
  Sci. Technol. Adv. Mater., 7(6), 502-510 (2006).
• S. Yagi, K. Murase, T. Hirato, Y. Awakura
  Fe-Cr Alloying of Iron Surface by Asymmetric Alternating Pulsed Electrolysis using Trivalent Chromium Solution
  Electrochem. Solid-State Lett., 9(5), B32-B34 (2006).［速報論文］
• K. Arai, S. Hagiwara, S. Takayama, K. Murase, T. Hirato, Y. Awakura
  Galvanic Contact Deposition of CdTe from Ammoniacal Basic Electrolytes at Elevated Temperatures using an Autoclave-type Vessel
  Electrochem. Commun., 8(4), 605-609 (2006).［速報論文］
• K. Arai, K. Murase, T. Hirato, Y. Awakura
  Studies of Oxidation Behaviors of CdTe in Ammoniacal Basic Electrolytes
  Electrochim. Acta, 51(23), 4987-4993 (2006).
• S. G. Neophytides, K. Murase, S. Zafeiratos, G. Papakonstantinou, F. E. Paloukis, N. V. Krstajic, and M. M. Jaksic
  Composite Hypo-Hyper-d-Intermetallic and Interionic Phases as Supported Interactive Electrocatalysts
  J. Phys. Chem. B, 110(7), 3030-3042 (2006).
• T. Katase, R. Kurosaki, K. Murase, T. Hirato, Y. Awakura
  Formation of Cu-Sn Alloy Layer by Contact Deposition Using Quaternary Ammonium Imide Type Ionic Liquid
  Electrochem. Solid-State Lett., 9(4), C69-C72 (2006).［速報論文］
• T. Shinagawa, M. Izaki, H. Inui, K. Murase, and Y. Awakura
  Microstructure and Electronic Structure of Transparent Ferromagnetic ZnO-Spinel Iron Oxide Composite Films
  Chem. Mater., 18(3), 763-770 (2006).
• *邑瀬邦明, 玉川宏平, 安部吉史, 粟倉泰弘
  塩化銅(I)を含むハロゲン化ナトリウム濃厚水溶液からの銅デンドライト電析 − 銅カソードとチタンカソードにおける電析挙動 −
  資源と素材, 122(1), 21-25 (2006).
• K. Arai, K. Murase, T. Hirato, and Y. Awakura
  Effect of Chloride Ions on Electrodeposition of CdTe from Ammoniacal Basic Electrolytes
  J. Electrochem. Soc., 153(2) C121-C126 (2006).
• 荒井健太郎, 川口 潤, 邑瀬邦明, 平藤哲司, 粟倉泰弘
  塩基性浴を用いた CdTe 電析におよぼす塩化物イオンの影響
  表面技術, 57(1), 70-76 (2006).
• T. Shinagawa, M. Izaki , K. Murase , Y. Matsumura , Y. Awakura
  Thermal Phase Transformation of ZnO-based Transparent　Ferromagnetic Composite Films and the Change in Magnetic Characteristics
  J. Electrochem. Soc., 153(2), G168-G174 (2006).

- 2005年

• *邑瀬邦明, 石田雅人, 江森郁子, 山末英嗣, 平藤哲司, 粟倉泰弘
  複合めっき法による TiO₂ 分散 Ni-Mo 合金皮膜の作製とその評価
  表面技術, 56(11), 692-697 (2005).
• T. Shinagawa, M. Izaki, H. Inui, K. Murase, and Y. Awakura
  Characterization of Transparent Ferromagnetic Fe:ZnO Semiconductor Films Chemically Prepared from Aqueous Solutions
  J. Electrochem. Soc., 152(10), G736-G741 (2005).
• T. Katase, T. Onishi, S. Imashuku, K. Murase, T. Hirato, and Y. Awakura
  Water Content and Properties of Aliphatic Ammonium Imide-Type Room Temperature Ionic Liquid Containing Metal Ions
  Electrochemistry 電気化学および工業物理化学, 73(8), 686-691 (2005).
• S. Yagi, K. Murase, S. Tsukimoto, T. Hirato, Y. Awakura
  Electroless Nickel Plating onto Minute Patterns of Copper Using Ti(IV)/Ti(III) Redox Couple
  J. Electrochem. Soc., 152(9), C588-C592 (2005).
• *邑瀬邦明, 玉川宏平, 溝田　尚, 元場和彦, 安部吉史, 粟倉泰弘
  塩化銅(I)を含むハロゲン化ナトリウム濃厚水溶液からの銅デンドライトの電析挙動
  資源と素材, 121(4-5) 103-110 (2005).
• 八木俊介, 邑瀬邦明, 平藤哲司, 粟倉泰弘
  TiN表面へのCuおよびPdの置換析出挙動とその熱力学的考察
  表面技術, 56(3), 145-150 (2005).
• K. Arai, S. Hagiwara, K. Murase, T. Hirato, and Y. Awakura
  Galvanic Contact Deposition of CdTe Layers using Ammoniacal Basic Aqueous Solution
  J. Electrochem. Soc., 152(4), C237-C242 (2005).
• *K. Murase, Y. Tanaka, T. Hirato, and Y. Awakura
  Electrochemical Quartz Crystal Microbalance Studies of CdTe Formation and Dissolution in Ammoniacal Basic Aqueous Electrolytes
  J. Electrochem. Soc., 152(5), C304-309 (2005).
• K. Mizuno, M. Izaki, K. Murase, T. Shinagawa, M. Chigane, M. Inaba, A. Tasaka, and Y. Awakura
  Structural and Electrical Characterizations of Electrodeposited p-type Semiconducting Cu₂O Films
  J. Electrochem. Soc., 152(4), C179-182 (2005).

- 2004年

• Y. Awakura, K. Murase, and T. Hirato
  Electrodeposition of CdTe Semiconductor Layers from Basic Ammoniacal Aqueous Solutions - Thermodynamics, Morphology, and Electrical Properties
  High Temp. Mater. Process., 23(5-6), 383-398 (2004).
• *邑瀬邦明, 桜田毅彦, 粟倉泰弘
  ヒドラジンを還元剤とするタングステン含有コバルトの無電解めっき
  表面技術, 55(8), 565-567 (2004).［ノート］
• *K. Murase, M. Ogawa, T. Hirato, and Y. Awakura
  Design of Acidic Ni-Mo Alloy Plating Baths Using a Set of Apparent Equilibrium Constants
  J. Electrochem. Soc., 151(12), C798-C805 (2004).
• M. Miyake, K. Murase, H. Inui, T. Hirato, and Y. Awakura
  Analytical Transmission Electron Microscopy Study of CdTe Layer Electrodeposited from Basic Ammoniacal Aqueous Electrolyte
  J. Electrochem. Soc., 151(11), C712-C715 (2004).
• T. Shinagawa, M. Izaki, K. Murase, Y. Awakura, and Y. Matsumura
  Transparent Ferromagnetic Semiconductor Fe-Zn-O Hetero-granular Film
  Electrochem. Solid-State Lett., 7(10), G235-G237 (2004).［速報論文］
• A. Togo, I. Tanaka, K. Murase, T. Yamamoto, T. Suga, and E. Matsubara
  Atomic and Electronic Structures of Hydrated Polymolybdates by First Principles Calculations
  Mater. Trans., 45(7), 1982-1986 (2004).
• *邑瀬邦明, 小田　暢, 平藤哲司, 粟倉泰弘
  酸性クエン酸水溶液からのCdTe薄膜電析
  表面技術, 55(5), 360-365 (2004).
• K. Mizuno, M. Izaki, T. Shinagawa, M. Chigane, K. Murase, M. Inaba, A. Tasaka, and Y. Awakura
  Electrical Characterization of Electrodeposited p-Type Semiconducting Cu₂O Films
  Trans. Mater. Res. Soc. Jpn., 29(5), 2261-2263 (2004).
• *K. Murase and Y. Awakura
  Electrodeposition of Metals from Quaternary Ammonium Imide Type Room Temperature Ionic Liquid
  Trans. Mater. Res. Soc. Jpn., 29(1), 55-58 (2004).
• M. Miyake, K. Murase, T. Hirato, and Y. Awakura
  Hall Effect Measurements on CdTe Layers Electrodeposited from Acidic Aqueous Electrolyte
  J. Electroanal. Chem., 562, 247-253 (2004).
• M. Miyake, K. Murase, H. Inui, T. Hirato, and Y. Awakura
  Comparison of Microstructures of CdTe Layers Electrodeposited from Basic Ammoniacal and Acidic Sulfate Electrolytes
  J. Electrochem. Soc., 151(3), C168-C175 (2004).

- 2003年

• M. Miyake, K. Murase, T. Hirato, and Y. Awakura
  Electrical Properties of CdTe Layers Electrodeposited from Ammoniacal Basic Electrolytes
  J. Electrochem. Soc., 150(6), C413-C419 (2003).
• *K. Murase, M. Matsui, M. Miyake, T. Hirato, and Y. Awakura
  Photo-assisted Electrodeposition of CdTe Layer from Ammoniacal Basic Aqueous Solutions
  J. Electrochem. Soc., 150(1), C44-C51 (2003).
• M. Miyake, K. Murase, T. Hirato, and Y. Awakura
  Effect of Anions on Electrodeposition of CdTe from Ammonia-alkaline Solutions
  Surf. Coat. Technol., 169/170, 108-111 (2003).

- 2002年

• *邑瀬邦明, 本田 崇, 平藤哲司, 粟倉泰弘
  ジエチレントリアミンを含む塩基性浴からのCdTe薄膜の電析
  表面技術, 53(8), 535-543 (2002).
• H. Kawamura, M. Takahashi, N. Hojo, M. Miyake, K. Murase, K. Tamura, K. Uosaki, Y. Awakura, J. Mizuki, and E. Matsubara
  Evidence for the Diffusion of Au Atoms into the Te UPD Layer formed on Au(111) Substrate
  J. Electrochem. Soc., 149(2) C83-C88 (2002).

- 2001年

• *邑瀬邦明, 古田成生, 平藤哲司, 粟倉泰弘
  TiN薄膜の酸化溶解による銅の置換析出挙動
  表面技術, 52(11), 773-777 (2001).
• *K. Murase, K. Nitta, T. Hirato, and Y. Awakura
  Electrochemical Behavior of Copper in Trimethyl-n-hexylammonium
  Bis((trifluoromethyl)sulfonyl)amide, an Ammonium Imide-type Room Temperature Molten Salt
  J. Appl. Electrochem., 31(10), 1089-1094 (2001).
• *K. Murase, T. Honda, M. Yamamoto, T. Hirato, and Y. Awakura
  Electrodeposition of CdTe from Basic Aqueous Solutions Containing Ethylenediamine
  J. Electrochem. Soc., 148(3), C203-C210 (2001).

- 2000年以前

• *K. Murase, H. Ando, E. Matsubara, T. Hirato, and Y. Awakura
  Determination of Mo(VI) Species and Composition in Ni-Mo Alloy Plating Baths by Raman Spectra Factor Analysis
  J. Electrochem. Soc., 146(6), 2210-2217 (2000).
• *K. Murase, H. Watanabe, S. Mori, T. Hirato, and Y. Awakura
  Control of Composition and Conduction Type of CdTe Film Electrodeposited from Ammonia Alkaline Aqueous Solutions
  J. Electrochem. Soc., 146(12), 4477-4484 (1999).
• *K. Murase, H. Watanabe, T. Hirato, and Y. Awakura
  Potential-pH Diagram of the Cd-Te-NH₃-H₂O System and Electrodeposition Behavior of CdTe from Ammoniacal Alkaline Baths
  J. Electrochem. Soc., 146(5), 1798-1803 (1999).
• *K. Murase, H. Watanabe, H. Uchida, T. Hirato, and Y. Awakura
  Photo-assisted Electrodeposition of CdTe from Ammoniacal Alkaline Aqueous Solution
  Electrochemistry 電気化学および工業物理化学, 67(4), 331-335 (1999).［速報論文］
• *邑瀬邦明, 中谷 巌, 平藤哲司, 粟倉泰弘
  アンモニア−アルカリ性浴からの CdTe 電析におよぼすアンモニア濃度の影響
  表面技術, 50(4), 367-373 (1999).
• *K. Murase, H. Uchida, T. Hirato, and Y. Awakura
  Electrodeposition of CdTe Films from Ammoniacal Aqueous Solution at Low Cathodic Overpotentials
  J. Electrochem. Soc., 146(2), 531-536 (1999).
• *K. Murase, T. Honda, T. Hirato, and Y. Awakura
  Measurement of pH in the Vicinity of a Cathode during the Chloride-Electrowinning of Nickel
  Metall. Mater. Trans., Sect. B, 29, 1193-1198 (1998).
• 篠田弘造, 松原英一郎, 早稲田嘉夫, 植川英治, 邑瀬邦明, 平藤哲司, 粟倉泰弘
  水溶液中の Mo 錯体構造と Mo 合金めっき機構
  表面技術, 49(10), 1118-1121 (1998).　(社)表面技術協会平成12年度論文賞
• E. Uekawa, K. Murase, E. Matsubara, T. Hirato, and Y. Awakura
  Determination of Chemical Species and their Composition in Ni-Mo Alloy Plating Baths by Factor Analysis of Visible Absorption Spectra
  J. Electrochem. Soc., 145(2), 523-528 (1998).
• *T. Honda, K. Murase, T. Hirato, and Y. Awakura
  Measurement of pH in the Vicinity of a Cathode Evolving Hydrogen Gas Using Antimony Microelectrode
  J. Appl. Electrochem., 28, 617-622 (1998).
• T. Ozaki, J. Jiang, K. Murase, K. Machida, and G. Adachi
  Mutual Separation Characteristics for the Yttrium and Lanthanides with Chemical Vapor Transport Process Mediated by Metal Chloride Gaseous Complexes
  J. Alloys Comp., 265, 125-131 (1998).
• *K. Murase, K. Nishikawa, T. Ozaki, K. Machida, T. Suda, and G. Adachi
  Recovery of Vanadium, Nickel, and Magnesium from a Fly Ash of Bitumen-in-Water Emulsion by Chlorination and Chemical Vapor Transport
  J. Alloys Comp., 264, 151-156 (1998).
• *T. Ozaki, T. Miyazawa, K. Murase, K. Machida, and G. Adachi
  Vapor Phase Extraction and Separation of Rare Earths from Bastnaesite Concentrate Mediated by Vapor Complexes
  J. Alloys Comp., 245, 10-14 (1996).
• *T. Ozaki, K. Murase, K. Machida, and G. Adachi
  Extraction of Rare Earths and Thorium from Monazite by Chlorination with Carbon Tetrachloride
  Trans. Inst. Mining Metall., Sect. C, 105, 141-145 (1996).
• *K. Murase, G. Adachi, M. Hashimoto, and H. Kudo
  Mass Spectrometric Investigation of the Vapor over the RCl3-KCl (R/K = 1/1; R = Nd, Er) Melt at High Temperatures
  Bull. Chem. Soc. Jpn., 69, 353-357 (1996).
• *K. Murase, T. Ozaki, K. Machida, and G. Adachi
  Extraction and Mutual Separation of Rare Earths from Concentrates and Crude Oxides Using Chemical Vapor Transport
  J. Alloys Comp., 233, 96-106 (1996).
• *K. Murase, T. Fukami, K. Machida, and G. Adachi
  Mutual Separation of Mixed Praseodymium and Neodymium Oxides via Metal Halide Gaseous Complexes
  Ind. Engineer. Chem. Res., 34, 3963-3969 (1995).
• *K. Murase, K. Machida, and G. Adachi
  Recovery of Rare Metals from Scrap of Rare Earth Intermetallic Material by Chemical Vapour Transport
  J. Alloys Comp., 217, 218-225 (1995).
• *K. Murase, G. Adachi, G. D. Zissi, S. Boghosian, and G. N. Papatheodorou
  Raman Spectra of Liquids and Glasses in the RCl₃-AlCl₃ (R = Nd, Gd) Systems
  J. Non-Cryst. Solids, 180, 88-90 (1994).
• *K. Murase, K. Nishikawa, K. Machida, and G. Adachi
  Recovery of Nickel and Vanadium from a Fly Ash of Bitumen-in-Water Emulsion by Chemical Vapor Transport
  Chem. Lett., 1994, 1845-1848.［速報論文］
• *K. Murase, K. Machida, and G. Adachi
  Vapor Phase Extraction and Mutual Separation of Rare Earths from Monazite Using Chemical Vapor Transport Mediated by Vapor Complexes
  Chem. Lett., 1994, 1297-1300.［速報論文］
• *K. Murase, K. Shinozaki, Y. Hirashima, K. Machida, and G. Adachi
  Rare Earth Separation Using a Chemical Vapour Transport Process Mediated by Vapour Complexes of the LnCl₃-AlCl₃ System
  J. Alloys Comp., 198, 31-38 (1993).
• *K. Murase, K. Machida, and G. Adachi
  Recovery of Rare Metals from the Sludge of Samarium-Cobalt Magnetic Alloy by a Chemical Vapor Transporting Method
  Chem. Lett., 1992, 1555-1558.［速報論文］
• *K. Murase, K. Machida, and G. Adachi
  Mutual Separation Characteristics and Mechanism for Lanthanoid Elements via Gas Phase Complexes with Alkaline Metal and/or Aluminium Chloride
  Bull. Chem. Soc. Jpn., 65, 2724-2728 (1992).
• K. Machida, E. Yamamoto, K. Murase, G. Adachi, M. Taniguchi, and K. Tanaka
  Plasma Nitriding Characteristics of Sm₂Fe₁₇N_x
  Chem. Lett., 1992, 1243-1246.［速報論文］
• G. Adachi, K. Murase, K. Shinozaki, and K. Machida
  Mutual Separation Characteristics for Lanthanoid Elements via Gas Phase Complex with Alkaline Chlorides
  Chem. Lett., 1992, 511-514.［速報論文］
  
  Web of Science にて、登録されている邑瀬の報文を過不足なくすべて表示させる検索式は以下です
  　AUTHOR: Murase K* AND (Kitada A* OR Adachi G* OR Awakura Y* OR Tanaka I* OR Jaksic M* OR Sugimura H* OR Izaki M* OR Ichitsubo T*) NOT Sako H*
  　ADDRESS: Kyoto OR Osaka
  

国際会議 proceedings

• H. Sugimura, J.-H. Yang, S. Uchida, T. Higashino, Om P. Khatri, T. Ichii, and K. Murase
  Self-alignment of Gold Nanoparticles through the Control of Particle-substrate and Particle-particle Interactions
  Procedia Engineering, 36, 374-381 (2012).
  
• I. Sasaki, K. Murase, T. Ichii, Y. Uchimoto, and H. Sugimura
  Anodic Dissolution Behavior of Magnesium in Hydrophobic Ionic Liquids
  ECS Transactions, Vol. 33, No. 27, 2011, pp. 65-70 (218th ECS Meeting, Las Vegas, October 10-15, 2010).
• *K. Murase, K. Yanase, T. Ichii, and H. Sugimura
  Potentiostatic Cu-Zn Alloying for Polymer Metallization Using Medium-Low Temperature Ionic Liquid Baths
  ECS Transactions, Vol. 33, No. 7, 2010, pp. 515-521 (218th ECS Meeting, Las Vegas, October 10-15, 2010).
• T. Uda, K. Tsuchimoto, H. Nakagawa, K. Murase, Y. Nose, and Y. Awakura
  Electrochemical Polishing of Metallic Titanium in Ionic Liquid
  Proceedings of Second International Round Table on Titanium Production in Molton Salts, Tromso-Trondheim, Norway, 19-22 September 2010.
• *K. Murase, A. Ito, Y. Nishizaki, T. Ichii, and H. Sugimura
  Growth of Cu Alloy Layers through Reduction-Diffusion Method Using Ionic Liquid Bath at Medium-Low Temperatures
  Proceeding of the 3rd International Conference on Processing Materials for Properties (PMP-III), D. Mishra, A. Fuwa, and P. Bhandhubanyong (eds.), TMS, Warrendale, 2009, pp. 1143-1148.
• A. Ito, K. Murase, T. Ichii, and H. Sugimura
  Cu-Sn Alloy Metallization of Polymer through Reduction-Diffusion Method Using Ionic Liquid Bath at Medium-Low Temperature
  ECS Transactions, Vol. 16, No. 49, 2009, pp. 461-468 (214th ECS Meeting, Honolulu, October 12-18, 2008).
• Q.-W. Sun, K. Murase, T. Ichii, and H. Sugimura
  Electrochemical Behavior of Ferrocenylthiol / Alkanethiol Binary SAMs in Ionic Liquids
  ECS Transactions, Vol. 16, No. 49, 2009, pp. 575-581 (214th ECS Meeting, Honolulu, October 12-18, 2008).
• A. Ito, K. Murase, T. Ichii, and H. Sugimura
  Cu-Sn Alloy Metallization of Polymer Substrate through Reduction-Diffusion Method Using Ionic Liquid Bath at Medium-Low Temperatures
  Proceedings of 2008 Joint Symposium on Molten Salts, S. Deki, K.-I. Ota, Y. Iwadate, and M. Matsunaga (eds.), The Electrochemical Society of Japan, 2008, pp. 542-546.
• Om P. Khatri, K. Adachi, K. Murase, K. Okazaki, T. Torimoto, N. Tanaka, S. Kuwabata, and H. Sugimura
  Immobilization of Ionic Liquid-Stabilized Gold abd Silver Nanoparticles on Silicon: A Self-Assembly Approach
  Proceedings of 2008 Joint Symposium on Molten Salts, S. Deki, K.-I. Ota, Y. Iwadate, and M. Matsunaga (eds.), The Electrochemical Society of Japan, 2008, pp. 585-588.
• Q.-W. Sun, K. Murase, T. Ichii, and H. Sugimura
  Electrochemical Behavior of Ferrocenylthiol / Alkanethiol Binary SAMs in Ionic Liquid, TMHA-Tf₂N
  Proceedings of 2008 Joint Symposium on Molten Salts, S. Deki, K.-I. Ota, Y. Iwadate, and M. Matsunaga (eds.), The Electrochemical Society of Japan, 2008, pp. 610-613.
• *K. Murase, A. Ito, and H. Sugimura
  Faster Growth of Cu-Sn Layers through Reduction-Diffusion Method Using Ionic Liquid Bath at Medium-Low Temperatures
  ECS Transactions, Vol. 11, No. 28, 2008, pp. 103-109 (212th ECS Meeting, Washington, DC, October 7-12, 2007).
• S. Yagi, H. Oshima, K. Murase, E. Matsubara, and Y. Awakura
  Alternating Pulsed Electrolysis for Iron-Chromium Surface Alloying of Conventional Carbon Steel
  ECS Transactions, Vol. 11, No. 18, 2008, pp. 23-34 (212th ECS Meeting, Washington, DC, October 7-12, 2007).
• *K. Murase, Y. Awakura, and Y. Abe
  Electrodeposition Behavior of Dendritic Copper from Aqueous Copper(I) Chloride Solutions Containing Condensed Sodium Halides
  Cu2007 (The 6th International Copper/Cobre Conference) , Vol. 5: Electrorefining and Electrowinning, G. E. Houlachi, J. D. Edwards, and T. G. Robinson (eds.), The Metallurgical Society of CIM (MetSoc), 2007, pp. 639-650.
• H. Nakagawa, K. Tsuchimoto, T. Uda, K. Murase, and Y. Awakura
  Anodic Polarization Behavior of Titanium and Titanium-Nickel Electrode in Ionic Liquid
  Ti-2007 Science and Technology (The 11th World Conference on Titanium), M. Minomi, S. Akiyama, M. Ikeda, M. Hagiwara, and K. Maruyama (eds.), The Japan Institute of Metals, 2007, pp.1249-1252.
• *K. Murase, R. Kurosaki, T. Katase, H. Sugimura, T. Hirato, and Y. Awakura
  Electrochemical Alloying of Copper Substrate with Tin Using Ionic Liquid as an Electrolyte at Medium-Low Temperatures
  ECS Transactions, Vol. 3, No. 35, 2007, pp. 313-322 (210th ECS Meeting, Cancun, October 29 - November 3, 2006).
• *K. Murase, R. Kurosaki, T. Katase, T. Hirato, and Y. Awakura
  Formation of Cu-Sn Alloy Layers by Galvanic Contact Method Using Ionic Liquid Bath
  Proceedings of The 16th Iketani Conference (Masuko Symposium: Electrochemistry and Thermodynamics on Materials Processing for Sustainable Production), Tokyo, 13-15 November 2006, pp. 517-525.
• S. Yagi, K. Murase, T. Hirato, and Y. Awakura
  Alternating Pulsed Electrolysis for the Formation of Fe-Cr Alloy Layers with a Composition Gradient
  Proceedings of The 16th Iketani Conference (Masuko Symposium: Electrochemistry and Thermodynamics on Materials Processing for Sustainable Production), Tokyo, 13-15 November 2006, pp. 1001-1004.
• H. Nakagawa, T. Uda, K. Murase, T. Hirato, and Y. Awakura
  Anodic Dissolution Behavior of Titanium in Room Temperature Molten Salt (TMHA-Tf₂N)
  Advanced Processing of Metals and Materials (Sohn International Symposium), Vol. 3: Thermo and Physicochemical Principles - Special Materials and Aqueous and Electrochemical Processing, F. Kongoli and R. G. Reddy (eds.), TMS, Warrendale, 2006, pp. 641-649.
• S. Yagi, K. Murase, T. Hirato, and Y. Awakura
  Alternating Pulsed Electrolysis for Fe-Cr Alloy Coatings Using Trivalent Chromium Solution
  Advanced Processing of Metals and Materials (Sohn International Symposium), Vol. 7: Industrial Practice, F. Kongoli and R. G. Reddy (eds.), TMS, Warrendale, 2006, pp. 479-486.
• S. G. Neophytides, G. D. Papakonstantinou, J. M. Jaksic, K. Murase, D. Labou, and M. M. Jaksic
  Composite Hypo-Hyper-d-Intermetallic and Interionic Phases as Supported Interactive Electrocatalysis
  Proceedinds of International Hydrogen Energy Congress and Exhibition (IHEC 2005), Istanbul, Turkey, 13-15 July 2005.
• T. Shinagawa, M. Izaki, K. Murase, and Y. Awakura
  Chemical Preparation and Characterization of Transparent Ferromagnetic Fe:ZnO Semiconductor Films
  Magnetic Materials, Processes, and Devices VIII, S. Krongelb, C. Bonhote, S. R. Brankovic, Y. Kitamoto, T. Osaka, W. Schwarzacher, and G. Zangari (eds.), ECS Proceeding Series 2004-23, The Electrochemical Society, Pennington, 2006, pp. 211-217.
• *K. Murase, T. Hirato, and Y. Awakura
  Electrodeposition of Thin-Layered CdTe Semiconductor from Basic Aqueous Solutions
  Metallurgical and Materials Processing Principles and Technologies (Yazawa International Symposium), Vol. 3: Aqueous and Electrochemical Processing, H. Y. Sohn, K. Itagaki, C. Yamauchi, and F. Kongoli (eds.), TMS, Warrendale, 2003, pp. 51-64.
• *K. Murase, T. Hirato, and Y. Awakura
  Morphology of CdTe Electrodeposited from Ammoniacal Basic Aqueous Solutions
  Morphological Evolution in Electrodeposits -and- Electrochemical Processing in ULSI Fabrication and Electrodeposition of and on Semiconductors IV, K. Kondo, D. P. Barkey, J. C. Bradley, F. Argoul, P. C. Andricacos, and J. L. Stickney (eds.), ECS Proceeding Series 2001-08, The Electrochemical Society, Pennington, 2005, pp. 229-238.
• *K. Murase, K. Nitta, T. Hirato, and Y. Awakura
  Electrochemical Behavior of Copper in Ammonium Imide Type Room Temperature Molten Salt
  Proceeding of the 2nd International Conference on Processing Materials for Properties (PMP-II), B. Mishra and C. Yamauchi (eds.), TMS, Warrendale, 2000, pp. 783-788.
• *K. Murase, T. Hirato, Y. Awakura
  Electrodeposition of CdTe Semiconductor from Ammoniacal Aqueous Solutions
  Value-addition Metallurgy, W.D. Cho and H.Y. Sohn (eds.), TMS, Warrendale, 1998, pp. 213-224.
• *K. Murase, K. Machida, and G. Adachi
  Vapor Phase Extraction and Separation of Rare Earths Using Chemical Vapor Transport Mediated by Vapor Complexes
  J. Rare Earths (Special Issue), Proceeding of the 3rd International Conference on Rare
  Earth Development and Application, Vol. 1, 1995, pp. 12-15.

総説・解説記事

• 宇田哲也, 土本和明, 野瀬嘉太郎, 邑瀬邦明, 粟倉泰弘
  イオン液体中における金属チタンの電解研磨
  溶融塩および高温化学, 52(2), 49-55 (2009).
• 邑瀬邦明
  中低温イオン液体を用いた還元拡散法による銅合金形成
  溶融塩および高温化学, 52(1), 14-21 (2009).
• 邑瀬邦明
  中低温イオン液体浴を用いた還元拡散による銅合金形成
  化学工業, 59(3), 207-213 (2008).（口絵ページにカラー写真あり）
• 粟倉泰弘, 邑瀬邦明
  電気化学的に作製した CdTe 半導体薄膜 〜 電気特性と微細構造 〜
  金属, 75(11), 1151-1158 (2005).
• 邑瀬邦明, 粟倉泰弘
  電位−pH図を使って半導体電析を解釈する 〜 CdTe電析を例に 〜
  表面技術, 55(12), 903-906 (2004).
• 邑瀬邦明, 粟倉泰弘
  イオン性液体からの金属電析プロセス 〜 歴史と最近の動向 〜
  化学工業, 55(11), 866-870 (2004).
• 粟倉泰弘, 邑瀬邦明
  湿式法による太陽電池用CdTe薄膜材料の作製
  表面技術, 54(12), 984-987 (2003).
• 三宅正男, 乾 晴行, 邑瀬邦明, 平藤哲司, 粟倉泰弘
  酸性および塩基性水溶液からの電析CdTe半導体薄膜の微細組織
  まてりあ, 42(12), 907 (2003).
• 邑瀬邦明, 粟倉泰弘
  新しいイオン性液体からの金属および合金電析プロセス − その可能性
  Electrodeposition of Metals and Alloys from Novel Ionic Liquids
  月刊 MATERIAL STAGE, 3(7), 12-18 (2003).［2003年10月号］
• 伊崎昌伸, 品川　勉, 石川正巳, 片山順一, 西條義司, 伊東政俊, 邑瀬邦明
  紫外線カット機能をもつ透明強磁性材料
  工業材料, 51(10), 59-62 (2003).
• 邑瀬邦明, 平藤哲司, 粟倉泰弘
  ４級アンモニウムイミド型のイオン性液体からのマグネシウム合金電析 − 新しいイオン性液体からの金属および合金電析プロセス
  新たな展開が期待される表面技術・１, 電気鍍金研究会（大阪）, pp. 21-29, 2003.
• 邑瀬邦明, 粟倉泰弘
  塩基性水溶液からの電析法によるCdTe化合物半導体層の形成
  科学と工業, 75(8), 350-360 (2001).
• 守山実希, 邑瀬邦明, 藤川隆男, 小川真一, 村上正紀
  新時代を迎えたエレクトロニクス配線技術
  まてりあ, 39(11), 901-908 (2000).
• 邑瀬邦明, 粟倉泰弘
  アルカリ浴からの電解によるCdTe半導体薄膜の作製
  金属, 69(10), 894-904 (1999).
• 松原 英一郎, 邑瀬邦明
  水溶液中の金属錯体構造を見る！
  化学, 53(12), 61-62 (1998).
• 足立吟也, 邑瀬邦明
  希土類とニューガラス
  NEW GLASS, 11(2), 13-19 (1996).
• 足立吟也, 邑瀬邦明
  金属ハロゲン化物気相錯体とその応用
  化学, 48(9), 66-67 (1993).

著書・共同執筆

• 足立吟也 監修
  レアメタル便覧, 丸善, 2011年［編集幹事：太陽電池］
• 電気鍍金研究会 編
  次世代めっき技術 − 表面技術におけるプロセス・イノベーション, 日刊工業新聞社, 2004 年［分担執筆：イオン性液体からのめっきプロセス］
• 足立吟也 監修
  希土類の科学, 化学同人, 1999 年 ［分担執筆：ハロゲン化物］
• 福田 豊, 海崎純男, 北川 進, 伊藤 翼 編
  詳説 無機化学, 講談社サイエンティフィク, 1996 年 ［分担執筆：f-ブロック元素の化学］
• 足立吟也 監修, 足立研究室 編
  希土類物語, 産業図書, 1991 年 ［分担執筆：希土類元素の分析］

その他（読み物など）

• 新井 進, 上田幹人, 大貝 猛, 蒲生西谷美香, 邑瀬邦明, 八重真治, 松原 浩
  表面技術に見る夢（座談会）
  表面技術, 61(2), 95-107 (2010).
• 邑瀬邦明
  羽田空港から都区内へ向かう（くらべてみよう129）
  表面技術, 59(11), 746-748 (2008).
• 邑瀬邦明
  2001 Joint International Meeting - The 200th Meeting of The Electrochemical Society and The 52nd Meeting of the International Society of Electrochemistry 参加報告
  資源と素材, 118(1), 63-66 (2002).
• 邑瀬邦明
  新しい分野 − 金属学 − との出会い
  金属, 71(12), 1219 (2001).

特許

• 特開2002-371397（特願2001-180021）
  常温溶融塩を用いた金属の電析［出願日：2001年6月14日］
• 特開平07-258764（特願平06-049044）
  炭素系燃料の燃焼残さからの金属回収方法［出願日：1994年3月18日］
• 特開平06-207228（特願平04-025051）
  気相錯体の形成を利用した希土類−遷移金属合金からの希少金属の分離回収［出願日：1992年2月12日］
• 特開平06-184659（特願平04-336059）
  希土類元素を含む鉱石からの希土類の抽出および相互分離［出願日：1992年12月16日］
• 特開平05-051208（特願平03-237209）
  気相錯体の形成を利用した希土類元素の相互分離［出願日：1991年8月22日］